平行于电场的磁场对磁力电解复合抛光的影响  

The effect of the magnetic field on a magnetic-electrochemical compound polishing

作　　者：牛永江[1] 

机构地区：[1]天水师范学院工学院,甘肃天水741001

出　　处：《机械研究与应用》2010年第1期18-20,共3页Mechanical Research & Application

摘　　要：在传统的磁力电解复合抛光中,外加磁场的方向与电场方向垂直。通过给电解抛光外加一个平行于电场的磁场,对带电离子的运动状况进行分析,建立了带电离子运动的数学模型。并求出了带电粒子的速度方程和轨迹方程,分析了磁场在磁力电解复合抛光中的作用。由于所加磁场的作用,减小了电化学反应的浓差极化,加速了电化学反应速度和效率。通过实验,验证了该模型的合理性和对磁场功能分析的正确性。In the paper, the magnetic field is set to parallel the electrical field which is always vertical to the electrical field in a traditional magnetic - electrochemical compound polishing. The math model of the movement of the charged particles in a magnetic field is established through the analysis of its movement process, using Coulomb laws and Lorentz force. The velocity equations and loci equations are concluded, and the function of the magnetic field is drawn. Because of the magnetic field, the concentration polarization of electrochemical reaction can be reduced more and the electrochemical reaction can be accelerated easily. In the end, to verify the model, the magnetic - electrochemical compound polishing process has been tested and the resuits, compared with those obtained from the model, have showed the movement model is reasonable and the analysis to function of magnetic field is correct.

关 键 词：磁力电解复合抛光 磁场的作用 速度方程 

分 类 号：TM14[电气工程—电工理论与新技术]