Si_3N_4/Ni和Si_3N_4/Ni_3Al的界面固相反应  

Interfacial solid state reactions of Si_3N_4/Ni and Si_3N_4 /Ni_3Al couples

作　　者：高建杰[1] 汤文明[1] 吴玉程[1] 郑治祥[1] 

机构地区：[1]合肥工业大学材料科学与工程学院,安徽合肥230009

出　　处：《材料热处理学报》2010年第2期1-5,共5页Transactions of Materials and Heat Treatment

基　　金：安徽省自然科学基金(050440704)

摘　　要：使用扫描电子显微镜、电子能谱仪、X射线衍射等研究了在N2气氛中1150℃×10 h等温热处理的Si3N4/Ni,Si3N4/Ni3Al平面偶界面固相反应区的形貌、成分分布、显微结构及相组成。结果表明:Si3N4/Ni界面固相反应形成约20μm厚的反应区,反应区主要由Ni3Si构成,其中分布着大量细密的孔洞;而Si3N4/Ni3Al界面固相反应形成约2μm厚的反应区,反应区具有比Ni3Al高得多的Al含量,反应区由NiAl及Ni3Si构成。Si3N4/Ni3Al具有比Si3N4/Ni高得多的界面化学相容性。The morphologies,phases,microstructure and elemental distributions of the Si3N4/Ni,Si3N4/Ni3Al couples reaction zones annealed at 1150 ℃ for 10 h under N2 atmosphere were studied by means of scanning electron microscope with energy disperse spectroscopy analyzer and X-ray diffraction.The results show that interfacial solid state reaction of Si3N4/Ni forms a reaction zone about 20 μm thickness.The reaction zone is composed of Ni3Si,in which a lot of small pores are distributed.Comparatively,the interfacial solid state reaction of Si3N4/Ni3Al forms a reaction zone about 2 μm thickness.The reaction zone is composed of NiAl and Ni3Si,containing a very higher Al content than Ni3Al.The Si3N4/Ni3Al couple has much higher chemical compatibility than the Si3N4/Ni couple.

关 键 词：SI3N4 NI3AL 界面固相反应 显微结构 相组成 

分 类 号：TB33[一般工业技术—材料科学与工程] O643.1[理学—物理化学]