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作 者:戴忠旭[1] 甘复兴[1] 汪的华[1] 姚禄安[1]
出 处:《中国腐蚀与防护学报》1998年第4期251-256,共6页Journal of Chinese Society For Corrosion and Protection
基 金:国家自然科学基金;金属腐蚀与防护国家重点实验室资助项目
摘 要:用电化学石英晶体微天平(EQCM)研究了中性Na_2SO_4溶液中钝化型缓蚀剂NaNO_2和沉淀型缓蚀剂Na_2SiO_3在铁上的成膜行为。根据EQCM原理和条件,推导了求解真实成膜质量变化的近似公式,获得了缓蚀剂成膜的等温动力学曲线。发现含钝化型缓蚀剂NaNO_2体系中铁表面膜的生长呈抛物线规律,而在含沉淀型缓蚀剂Na_2SiO_3体系中则为直线规律;水溶液中金属表面成膜具有与金属高温氧化成膜类似的动力学规律。Electrochemical Quartz Crystal Microbalance(EQCM), a new electrochemical technique developed in recent years, was employed to measure the tiny mass change of surface on metal electrode in solution. According to the principle of EQCM and experimental conditions, an equation was deduced to calculate the real mass change of the electrode surface during the filming. Some experimental isothemal curves of the filming kinetics in the presence of inhibitors were obtained. It was found that the film growth on iron in Na2SO4 solution with the inhibitors followed the parabolic law for the oxidizing inhibitor (NaNO2) or linear law for the precipitating inhibitor (Na2SiO3), that was similar to oxidation kinetics of some metals at high temperature.
分 类 号:TG174.42[金属学及工艺—金属表面处理]
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