铸造镍钼合金在浓盐酸介质中的钝化膜研究  

STUDY ON PASSIVATED FILM ON CAST Ni-Mo ALLOY IN CONCENTRATED HCI ACOD

作　　者：秦紫瑞[1] 李隆盛[1] 孙吉峰 于勇 邵有权 项礼 

机构地区：[1]大连理工大学,大连116023 [2]大连耐酸泵厂,大连116022

出　　处：《上海有色金属》1998年第4期154-158,共5页Shanghai Nonferrous Metals

摘　　要：本文采用多功能电子能谱仪，通过俄歇电子能谱AES和X光电子能谱，对在浓盐酸介质中的铸造镍铬合金的钝化膜进行了分析与研究。结果表明，该合金在50℃、36％HCl介质中，形成了一种含有Cl、Mo为主的氧化物膜。这层薄膜主要是Mo以MoO3形式在表面层富集，Ni在膜中主要以Ni2O3富集在膜的底部，因而提高了膜的稳定性。本试验中采用电化学方法形成的钝化膜厚度大约为10nm，过渡层厚度大约为15nm.AES and XPS analyses by means of poly-function electron energy spectrometry are made to investigate the passivated film formed on the surface of cast Ni-Mo alloy in concentrated HCl acid. The experimental results show that a kind of oxide film is formed on the surface of the alloy in the 36% HCl medium, which match contains Ni and Mo. In the film, Mo exists in the form of MoO and Ni in the form of NiO which is eariched at the bottom of the film, so that the stability of the film is enhanced. The thickness of the passivated film is about 10urn and that of the transitional layer about 15um.

关 键 词：铸造镍钼合金 浓盐酸介质 钝化膜 能谱分析 

分 类 号：TG146.15[一般工业技术—材料科学与工程] TG174.22[金属学及工艺—金属材料]