退火对CoFe/IrMn双层膜结构和磁性能的影响  

Effect of annealing on texture and magnetic properties of CoFe/IrMn bilayer

作　　者：祁先进[1] 李国华 王寅岗[1] 李子全[1] 

机构地区：[1]南京航空航天大学材料科学与技术学院,江苏南京210016 [2]保山市发展和改革委员会,云南保山678000

出　　处：《功能材料》2010年第1期14-16,共3页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(50671048)

摘　　要：采用高真空直流磁控溅射的方法制备了结构为//Ta(5nm)/Co75Fe25(5nm)/Ir20Mn80(12nm)/Ta(8nm)的双层膜,通过X射线衍射(XRD)、原子力显微镜(AFM)和振动样品磁强计(VSM)研究了退火对双层膜的结构及磁性能的影响;并通过样品在反向饱和场下停留不同的时间,研究了退火对双层膜的磁稳定性的影响。结果表明,退火使得IrMn(111)织构减弱,表面/界面粗糙度增大,交换偏置场减小,矫顽力增加,退火降低了双层膜的磁稳定性。The CoFe/IrMn bilayer was deposited by high vacuum magnetron sputtering on a silicon wafer substrate. The influences of annealing on texture and magnetic properties were investigated by X-ray diffraction （XRD）,atomic force microscopy （AFM） and vibrating sample magnetometry （VSM）. And the magnetic stability of both as-prepared and annealed CoFe/IrMn bilayers has been investigated by means of holding the film in a negative saturation field. The results show that the texture of IrMn（111）weakens and the surface/interface roughness increases after annealing,meanwhile,the exchange bias decreases and coercivity increases. Furthermore,the magnetic stability decreases after annealing.

关 键 词：退火 织构 界面粗糙度 交换偏置场 

分 类 号：O484.4[理学—固体物理]