一种考虑工艺波动的RC互连延时统计模型  

Novel Statistical Model of RC Interconnect Delay in Presence of Process Fluctuation

作　　者：杨杨[1] 董刚[1] 柴常春[1] 杨银堂[1] 冷鹏[1] 

机构地区：[1]西安电子科技大学微电子学院教育部宽禁带半导体材料与器件重点实验室,西安710071

出　　处：《系统仿真学报》2010年第3期584-588,共5页Journal of System Simulation

基　　金：国家自然科学基金(60606006);国家杰出青年基金(60725415);重点实验室基金(9140C030102060C0303)

摘　　要：基于Elmore延时模型,提出了一种考虑工艺波动的RC互连延时统计模型,在给定互连参数波动范围条件下,利用该模型可以得到互连延时均值和标准差的解析表达式,与目前国内外互连工艺波动研究中广泛采用的Hspice蒙特卡罗(Monte Carlo)分析方法相比,所提模型在确保计算精度的前提下大大缩短了计算时间,可以应用于VLSI的互连延时分析和优化设计中。Based on Elmore delay model, a novel statistical model of RC interconnect delay in the presence of process fluctuation was proposed. An analytic expression of mean and standard deviation of interconnect delay can be obtained for given fluctuation range of interconnect parameters. The computation results show that the lime ofcalculalion is greatly shortened with good calculating precision using the proposed novel statistical model as compared to the widely used Monte Carlo method based on Hspice. The proposed model can be used in simulating and optimizing of VLSI＇s interconnect delay.

关 键 词：RC互连 延时 工艺波动 统计模型 

分 类 号：TN405.97[电子电信—微电子学与固体电子学]