激光化学气相反应生长Ti(C,N)薄膜的成分及微观结构  

THE COMPOSITION AND MICROSTRUCTURE OF THE Ti(C,N) FILMS PRODUCED BY LASER CHEMICAL VAPOUR GROWTH

作　　者：张炳春[1] 李梅[1] 王亚庆[1] 冯钟潮[1] 

机构地区：[1]中国科学院金属研究所

出　　处：《材料研究学报》1998年第6期663-664,共2页Chinese Journal of Materials Research

基　　金：863计划新材料领域资助

摘　　要：运用XRD、EPMA、TEM等手段分析在Ti—6Al—4V基材上用激光化学气相反应生长的Ti（C，N）薄膜的成分、结构、显微组织可在基材表面形成大面积均匀的Ti（C，N）膜层，为无明显择优取向的等轴纳米晶，其中有少量的Ti2N相，且Al、V含量低于基材。The composition and microstructure of Ti(C,N) films, which were produced by laser chemical deposition on Ti-6Al-4V substrate, were studied by the combined techniques of XRD, EPMA,TEM. The large area, uniform films which were mainly Ti(C,N) with small amounts of Ti2N phase, can be produced. The Al, V concentrations in films were lower than that of the substrates. TEM images implied that the films were equiaxial nano-crystalline without preferred orientation.

关 键 词：激光 化学气相反应 薄膜 TI(C N) 微观结构 

分 类 号：O484.1[理学—固体物理]