TiN 类薄膜的激光化学汽相沉积  

TiN Film of Laser induced Chemical Vapor Deposition

作　　者：张鸿俭[1] 夏德顺[1] 张鹤 

机构地区：[1]沈阳工业学院材料工程系,北京长征科技信息研究所,首都航天机械公司波纹管厂

出　　处：《导弹与航天运载技术》1998年第6期32-37,共6页Missiles and Space Vehicles

摘　　要：在Ｔｉ和Ｔｉ合金表面镀上一层薄膜以提高它的硬度、耐磨性及耐蚀性等是很有意义的。研究了用激光化学汽相沉积的方法在Ｔｉ和Ｔｉ－６Ａｌ－４Ｖ基体材料上沉积ＴｉＮ、ＴｉＣ、Ｔｉ（Ｃ．Ｎ）薄膜的工艺，并获得了良好膜层的最佳工艺。在低压下用激光化学汽相沉积（ＬＣＶＤ）方法制备成功的ＴｉＮ类薄膜颜色金黄，成份均匀，其平均显微硬度为２５００ＨＫ，耐磨性比基体材料提高６倍。It is meaningful to plate film on Ti or Ti alloy in order to improve the properties of hardness, wear resistance, corrosion resistance,fatigue, etc. The technologies to obtain TiN, TiC,Ti(C.N)composite films on Ti and Ti-6Al-4V substrates by laser induced chemical vapro deposition(LCVD) are studied and the best process to obtain films has been found. The pure stoichiometric TiN like films which are obtained by LCVD under low pressure have homochromatic ingredients and golden color. The average microhardness of LCVD TIN films is 2 500 HK and the wear resistance is six times as much as that of substrates.

关 键 词：薄膜 钛合金 化学汽相沉积 氮化钛 

分 类 号：TG174.44[金属学及工艺—金属表面处理]