掺银ITO薄膜退火前后的性能比较  

Properties Contrast of ITO Films by Ag Doping and Annealing

作　　者：郭守月[1] 曹春斌[1,2] 孙兆奇[2] 

机构地区：[1]安徽农业大学理学院,合肥230036 [2]安徽大学物理与材料科学学院,合肥230039

出　　处：《吉林大学学报（理学版）》2010年第2期291-294,共4页Journal of Jilin University:Science Edition

基　　金：国家自然科学基金(批准号:50642038);安徽省自然科学基金(批准号:JK2008B015;JK2008B09ZC)

摘　　要：采用直流磁控溅射方法在室温下制备厚度为130nm的ITO和Ag-ITO薄膜,并在大气环境中不同温度下退火1h,测试其XRD谱和近紫外-可见光透射谱.利用(211)和(222)衍射峰求得两种薄膜的晶格常数,并分析了掺Ag和退火对ITO薄膜晶格常数、结晶度和透射率的影响.结果表明:晶格常数随退火温度的升高而减小,且掺Ag后晶格进一步收缩;两种薄膜经高温退火后在可见光段具有相近的透射率,未退火和低温退火的Ag-ITO薄膜透射率明显低于相同条件处理的ITO薄膜.ITO and Ag-ITO thin films with a thickness of 130 nm were respectively deposited on glass substrates at room temperature, and post annealed in atmosphere for 1 h. The microstructure and transmittance spectra of all the samples were measured by X-ray diffraction （XRD） and uhraviolet-visible spectrophotome- try, respectively. The lattice constants in the normal direction of the crystal faces （2I 1 ） and （222） of all the films were calculated. The lattice constants were decreased with the increase of annealing temperature and the lattice was further distortion found after Ag doping in ITO matrix. The ITO and Ag-ITO films have almost the same transmittance in the visible range at high annealing temperatures. But the transmittances of the two kinds of films were quite different at lower annealing temperatures. The influences of annealing and Ag doping on lattice constant, ervstallinitv and transmittance of ITO films were also discussed.

关 键 词：ITO薄膜 AG掺杂 退火 晶格常数 透射率 

分 类 号：O484[理学—固体物理]