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作 者:王绍华[1] 王军丽[1] 徐瑞东[2] 章俞之[3]
机构地区:[1]昆明理工大学分析测试研究中心,云南昆明650093 [2]昆明理工大学能源与冶金工程学院,云南昆明650093 [3]中国科学院特种无机涂层重点实验室,上海200050
出 处:《材料保护》2010年第3期34-37,共4页Materials Protection
基 金:国家自然科学基金(20806035);云南省中青年学术和技术带头人后备人才基金(2009CI026);云南省应用基础研究计划(2007E187M);中国科学院特种无机涂层重点实验室开放课题基金;云南省教育厅科学研究基金(08C0025);昆明理工大学人才培养基金(2009-029)
摘 要:通过Ni,W,P与CeO2,SiO2纳米颗粒的双脉冲电沉积,在普通碳钢表面制备了Ni-W-P/CeO2-SiO2纳米复合材料沉积层。在正、反向脉冲占空比(10%,30%)和正、反向脉冲平均电流密度(15.0,1.5A/dm2)恒定下,研究了正、反向脉冲时间对纳米复合材料电沉积的影响。采用能谱、硬度测试和扫描电镜等方法,对纳米复合材料沉积层的化学组成、沉积速率、显微硬度和表面形貌进行了表征。结果表明:当正、反向脉冲时间分别控制在300ms和40ms时,Ni-W-P基质金属轮廓清晰,晶粒细小而均匀,CeO2和SiO2纳米颗粒在基质金属中均匀弥散分布;沉积层的化学组成(质量分数)为:70.89%Ni,9.89%W,8.59%P,7.35%CeO2,2.81%SiO2;沉积速率为45.1μm/h,显微硬度为706HV。Ni-W-P/CeO2-SiO2 nanocompos-ite coatings were prepared on the surface of carbon steel by dual pulse co-deposition of Ni, W, P and particles of nano-CeO2 and nano-SiO2. The influence of positive and negative pulse working time on the electrodeposition of the nanocomposite was researched at constant positive and negative pulse duty cycles of 10% and 30% and constant average pulse current densities of 15. 0 A/dm2 and 1. 5 A/dm2. The microhardness of the coatings was measured by using a microhardness meter, while the composition, deposi-tion rate and surface morphology of the coatings were analyzed by means of scanning electron microscopy and energy dispersive spectrometry. Results show that when the positive and negative pulse working time is controlled at 300 ms and 40 ms respective-ly, the resulting nanocomposite coating possesses clear outline of Ni-W - P matrix metal crystallite, fine and uniform crystals, as well as uniform distribution of nano-CeO2 and nano-SiO2 parti-cles within the matrix metal. The chemical composition of the coating was determined to be 70. 89% Ni, 9. 89% W, 8.59% P, 7. 35% CeO2 and 2. 81 % SiO2( mass fraction) , and the dep-osition rate and microhardness of the coating were determined to be 45. 1 μm/h and 706 HV.
关 键 词:双脉冲 Ni—W·P/CeO2-SiO2 纳米复合材料 电沉积 脉冲时间 沉积速率 显微硬度
分 类 号:TB383.1[一般工业技术—材料科学与工程]
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