Microstructure and Mechanical Properties of Multilayer Ti(C,N) Films by Closed-field Unbalanced Magnetron Sputtering Ion Plating  

作　　者：Guojun Zhang Bin Li Bailing Jiang Dichun Chen Fuxue Yan 

机构地区：[1]School of Materials Science and Engineering, Xi~an University of Technology, Xi'an 710048, China

出　　处：《Journal of Materials Science & Technology》2010年第2期119-124,共6页材料科学技术（英文版）

基　　金：supported by the National Natural Science Foundation of China (No. 50971097);Shaanxi Provincial Project of Special Foundation of Key Disciplines

摘　　要：Ti（C, N） multilayer films have been prepared by closed-field unbalanced magnetron sputtering technology and using graphite target as the C supplier. Microstructural observation results showed that the Ti（C, N） films exhibited multilayer structure with most of fine nano-columnar Ti（C, N） grains existing in the films. The current of graphite target had an effect remarkably on the multilayer structure of films： the periodical thickness gradually increased as the current went up, but the grain size of films gradually decreased and even amorphous phase appeared as the current further increased. The microstructure of Ti（C, N） films changed from columnar crystallite to nanocomposite in high current of graphite target where the fine Ti（C, N） grains were distributed uniformly in the amorphous Ti（C, N） matrix, and the volume fraction of the amorphous phase increased with increasing current. Measurement results showed that the Ti（C, N） multilayer films have high rnicrohardness and low friction coefficient, and especially the film deposited in the current of 0.9 A exhibits superior properties with optimizing hardness and friction coefficient. Based on the relationship of the microstructure and the properties of films, the multilayer structure and fine grain size of Ti（C, N） films are responsible for their well mechanical and friction properties. And choosing the graphite target as the C supplier is more propitious to decrease the friction coefficients of films.Ti（C, N） multilayer films have been prepared by closed-field unbalanced magnetron sputtering technology and using graphite target as the C supplier. Microstructural observation results showed that the Ti（C, N） films exhibited multilayer structure with most of fine nano-columnar Ti（C, N） grains existing in the films. The current of graphite target had an effect remarkably on the multilayer structure of films： the periodical thickness gradually increased as the current went up, but the grain size of films gradually decreased and even amorphous phase appeared as the current further increased. The microstructure of Ti（C, N） films changed from columnar crystallite to nanocomposite in high current of graphite target where the fine Ti（C, N） grains were distributed uniformly in the amorphous Ti（C, N） matrix, and the volume fraction of the amorphous phase increased with increasing current. Measurement results showed that the Ti（C, N） multilayer films have high rnicrohardness and low friction coefficient, and especially the film deposited in the current of 0.9 A exhibits superior properties with optimizing hardness and friction coefficient. Based on the relationship of the microstructure and the properties of films, the multilayer structure and fine grain size of Ti（C, N） films are responsible for their well mechanical and friction properties. And choosing the graphite target as the C supplier is more propitious to decrease the friction coefficients of films.

关 键 词：Ti（C  N） Multilayer film Graphite target 

分 类 号：TG146.21[一般工业技术—材料科学与工程] O484.1[金属学及工艺—金属材料]