磁头结构表面刻蚀深度对磁头飞行姿态影响的实验研究  

Experimental Analysis of the Recess Slider in Magnetic Recording System with Ultra-Thin Spacing

作　　者：牛荣军[1] 刘红彬[1] 黄平[2] 

机构地区：[1]河南科技大学机电工程学院,河南洛阳471003 [2]华南理工大学机械设计及理论研究所,广州510640

出　　处：《测试技术学报》2010年第1期84-88,共5页Journal of Test and Measurement Technology

基　　金：国家重点基础研究发展计划资助项目(2003CB716205)

摘　　要：随着磁盘容量的不断增大,测试技术也不断得到发展.本论文中,工作在纳米级条件下的磁头飞行姿态由动态飞高测试仪获得.通过实验测试方法分析了3层2台阶负压型磁头表面结构的刻蚀深度对磁头飞行姿态的影响.实验测试结果表明刻蚀深度的变化对磁头飞行姿态有明显的影响:随着次景层深度的增加,最小飞行高度和俯仰角都有明显增大趋势;最小飞行高度随着基层深度的增加基本呈增大趋势,而俯仰角呈下降趋势;侧翻角对次景层和基层深度变化不敏感.实际的磁头结构设计中可实验测试结果和优化组合方法选择最佳结构表面刻蚀深度来降低磁头的飞行高度,从而达到增大磁盘存储容量的目的.The attitudes of a magnetic head working on the nanometer scale are measured with a dynamic flying height tester. Detailed experimental analysis and the results show that the recess of ABS has significant influence on the flying attitudes of slider. The minimum flying height and pitch angle increase with the increase of shallow recess. The minimum flying height basically increases with the main recess increasing, but the pitch angle has opposite trend with the main recess increasing. However, the rolling angle is insensitive to the variation of shallow and main recess. In the practical application, the profile of slider may be designed based on the experimental results and optimum combination method to achieve the minimum flying height.

关 键 词：纳米技术 磁头/磁盘 实验测试 

分 类 号：TH117.2[机械工程—机械设计及理论]