后栅极场发射显示板结构参数在公差范围内变化对工作特性的影响  

Influence of Structural Variations in Tolerance on Performance of Under-Gate Field Emission Display Panel

作　　者：仲雪飞[1] 张雄[1] 尹涵春[1] 雷威[1] 王保平[1] 

机构地区：[1]江苏省信息显示工程技术研究中心东南大学电子科学与工程学院,南京210096

出　　处：《真空科学与技术学报》2010年第2期116-121,共6页Chinese Journal of Vacuum Science and Technology

基　　金：国家自科学基金资助项目(No.60801002);高等学校学科创新引智计划(111计划)资助项目(B07027)

摘　　要：后栅极场发射显示板是一种常用的场致发射器件。该器件结构由阳极、阴极和栅极组成,并且栅极置于阴极背面。本文采用模拟计算的方法研究了标准结构场发射区域内的电场分布、阴极表面的发射情况、电子轨迹和着屏束斑。并研究了关键结构参数在公差范围内变化对阴极发射特性和阳极着屏束斑的影响。计算结果显示结构参数在公差范围内的变化对阴极发射状况,阳极束斑栅极调制特性的影响很小,进而证明了后栅极结构对工艺一致性要求较低。The impacts of the variations in the structures of the anode, cathode, and gate of the under-gate iield emission display panel within the tolerance, on the field emission characteristics were simulated. The physical quantities, such as the electric field distribution inside the emission region, field emission characteristics of the cathode, the electron trajectories and spot on the anode in the conventional stucture, were evaluated. The simulated results show that the structural variations within the technical tolerance influence the field emission characteristics spot on the anode and modulation performance of gate little. In addition, the under-gate structure requires rather mild fabrication precision.

关 键 词：电子技术 场发射显示 模拟计算 后栅极结构 

分 类 号：O462.4[理学—电子物理学]