钽粉的低温掺氮及氮在钽中的分布  

Method of Tantalum Powder NitrogenDoping and the Distribution of Nitrogen in Tantalum

作　　者：何季麟 潘伦桃 郑爱国 王向东[2] 

机构地区：[1]中色有色集团公司,宁夏石嘴山75300 [2]北京有色金属研究院,北京100038

出　　处：《中国材料进展》2010年第2期50-52,共3页Materials China

摘　　要：叙述了钽粉在镁还原脱氧后引入氮气对钽粉进行掺氮,在200℃以下0.1MPa以上,保温时间大于2h时,得到的钽粉粒子间含氮差别率在20%以下。用俄歇电子能谱仪对渗氮的钽表面进行元素分布研究,发现氮在钽中分布是不均匀的,对于每个粒子也是外表面氮浓度大于钽内部的氮浓度。Tantalum powder after being reducd with magnesium was doped in an atmosphere of nitrogen with a pressure higher than 0. 1 MPa for more than 2 hours at a temperature lower than 200℃. The maximum difference ratio of the nitrogen content between tantalum particles was lower than 20%. The non-uniform distribution of nitrogen in the surface layer of tantalum was observed with Auger electron spectrometry, and it was found that the nitrogen content in the outer layer is higher than that in the inner layer for every particle.

关 键 词：钽粉 掺氮 氮在钽中的分布 

分 类 号：TG156.82[金属学及工艺—热处理]