卤化铜激光器的进展  

Development of Copper Halide Laser

作　　者：姚志欣[1] 潘佰良[1] 陈星[1] 马涛[1] 周国耀[1] 

机构地区：[1]浙江大学物理系,杭州310027

出　　处：《激光与光电子学进展》1998年第6期1-5,共5页Laser & Optoelectronics Progress

基　　金：曹光彪高科技发展基金

摘　　要：介绍了卤化铜激光器的最新动向．回顾了卤化铜激光器的工作原理、工作物质的选择和工作方式的进展，讨论了高功率溴化工铜激光器的作用机制．展望了高功率、全封离溴化亚铜激光器的前景。The recent development of copper halide laser is introduced. The workingprinciple, the selection of lasants and the tendency of work lug methods are reviewed.The active mechanism of high power copper bromide laser is discussed, and the future prospect of high power and all sealed-off copper bromide lasers is offered.

关 键 词：溴化亚铜激光器 掺氢 卤化铜 激光器 

分 类 号：TN248.5[电子电信—物理电子学]