活性屏离子氮化过程中氮的输运机理分析  

Analysis of Mass Transferring in Active Screen Plasma Nitriding

作　　者：金应荣[1] 刘锦云[1] 李孔军[1] 赵广彬[1] 

机构地区：[1]西华大学材料科学与工程学院,四川成都610039

出　　处：《西华大学学报（自然科学版）》2010年第2期58-61,共4页Journal of Xihua University:Natural Science Edition

基　　金：西华大学材料学重点学科建设资金;高档数控机床与基础制造装备科技重大专项经费资助(2009ZX04012-023-04)

摘　　要：将活性屏离子氮化过程中活性氮原子的输运方式分为无输运介质的扩散输运与有输运介质的吸附输运两种,指出扩散输运是活性氮原子的重要输运方式之一。此外,还重新分析了文献报道的活性屏离子氮化实验结果,阐述了活性屏材质等因素对氮化效果的影响。There are two kinds of mass transferring methods in active screen plasma nitriding, one is the diffusion of active particles containing nitrogen atoms, and the other is the adsorption nitrogen in sputtering particles. The first one is the most important manner of nitrogen transferring. In addition, experimental results reported in literatures are investigated again, and effects on the nitriding of materials of active screen and other factors are discussed as well.

关 键 词：活性屏离子渗氮 气相扩散 输运机理 

分 类 号：TG156.8[金属学及工艺—热处理]