氮离子束轰击对电弧离子镀已沉积的TiAlN膜层性能影响的研究  

Effects of Nitrogen Ion Beam Bombardment on TiAlN Coatings Deposited by Arc Ion Plating

作　　者：吕树国[1,2] 刘常升[1] 张罡[2] 毕监智[2] 金光[2] 李玉海[2] 

机构地区：[1]东北大学材料与冶金学院,辽宁沈阳110004 [2]沈阳理工大学中俄联合高能束流实验室,辽宁沈阳110168

出　　处：《钢铁研究学报》2010年第3期34-37,共4页Journal of Iron and Steel Research

基　　金：科技部国际合作重点资助项目(2004DFA4800)

摘　　要：采用俄罗斯UVN 0.5D2I离子束辅助电弧离子镀沉积设备,利用N离子束轰击高速钢W18Cr4V基材上电弧离子镀已沉积完毕的TiAlN膜层。研究了不同能量的N离子束轰击对TiAlN膜层表面形貌、显微硬度和相结构的影响。SEM分析表明:TiAlN膜层表面"大颗粒"消失,凹坑浅而平整,粗糙度降低。X射线衍射分析表明:无N离子轰击时,TiAlN膜层是由TiAlN相和Ti2AlN相组成;随着轰击能量的增加,TiAlN膜层的相结构没有发生变化,但TiAlN(111)取向减弱,而(200)和(220)取向均增强;Ti2AlN(211)取向减弱。力学性能测试表明:N离子束轰击,使膜层的显微硬度由原来的2 100HV0.01提高到2 300HV0.01。TiAlN coatings were deposited on W18Cr4V high speed steel substrate by ion beam assisted arc ion plating device made in Russia UVN 0.5D2I. The effects of such TiAlN coatings irradiated by nitrogen ion beam with different energy on morphology, micro-hardness and phase structur. were studied. SEM analysis revealed that the density of large metal particles on coatings surface was decreased obviously, craters distribution with shallow and uniform on irradiated surface and improvement in surface roughness. XRD analysis indicated that TiAIN layer was constituted by TiAlN and Ti2 AlN phases without N ion beam bombarded, and there was no phase structure changed with irradiated energy increased, while TiAlN （111） crystal orientation reduced, as well as （200） and （220） increased and Ti2 AlN （211） decreased. Mechanics performance testing showed that, the hardness of irradiated coatings increased from 2 100HV0.01 to 2 300HV0.01 by means of ion beam irradiating.

关 键 词：离子束 TiAlN膜层 电弧离子镀 显微硬度 

分 类 号：TG174.44[金属学及工艺—金属表面处理]