KCl-NaCl-NaF-SiO_2熔盐体系中硅离子的还原机理研究  

Study on Reductive Mechanism of Si Ion in KCl-NaCl-NaF-SiO_2

作　　者：何小凤[1] 李运刚[1] 李智慧[1] 

机构地区：[1]河北理工大学,河北唐山063009

出　　处：《有色金属（冶炼部分）》2010年第2期24-26,41,共4页Nonferrous Metals（Extractive Metallurgy)

基　　金：国家自然科学基金资助项目(50674039)

摘　　要：在KCl-NaCl-NaF-SiO2熔盐体系中,以铂丝为参比电极、研究电极,高纯石墨坩埚为辅助电极,采用循环伏安法和计时电位法对硅离子的还原机理进行了研究,结果表明此电化学反应为扩散控制的不可逆电极过程;求得硅离子在熔盐中的扩散系数D=1.33×10-3cm2/s(CSi4+=1.21×10-4mol/cm3,T=1 073 K)。Pt as reference and reseach electrode,high pure graphite crucible as assistant electrode,the reductive mechanism of Si ion on Pt electrode was investigated in KCl-NaCl-NaF-SiO2 by using cyclic voltammetry and chronocoulometry,The results indicate that the reduction of Si ion was an irreversible process and the electrode reaction was diffusion-controlled by cyclic voltammetry;The diffusion coefficient D of Si ion in this system was 1.33×10-3cm2/s（CSi4＋=1.21×10-4 mol/cm3,T=1 073 K）.

关 键 词：SIO2 KCl-NaCl-NaF 循环伏安法 计时电位法 

分 类 号：TF82[冶金工程—有色金属冶金]