等离子喷涂制备碳化硼涂层  

Plasma Spray Boron Carbide Coating

作　　者：曾毅[1] 张叶方[1] 黄静琪[1] 夏继余[1] 丁传贤[1] 

机构地区：[1]中国科学院上海硅酸盐研究所,上海200050

出　　处：《无机材料学报》1998年第6期918-922,共5页Journal of Inorganic Materials

摘　　要：通过X射线衍射分析、光电子能谱仪和扫描电镜来分析等离子喷涂制备的碳化硼涂层的相组成和显微结构，用气孔率和显微硬度来表征涂层基本的性能．实验结果表明；对普通大气喷枪加以改进后，所得到的碳化硼涂层同国外采用高压等离子喷涂所得到的碳化硼涂层相比，具有更小的气孔率（3％～4％）和相接近的显微硬度（Hv＞28GPa）The phase composition and microstructure of boron carbide coatings by plasma spray wereinvestigated through X-Rad, XPS and SEM. The porosity and microhardness of the coatings werealso measured. The results showed that The plasma spray boron carbide coatings by using theimproved F4-MB plasma gun under atmospheric pressure had the lower porosity 3%~4% and theclosed microhardness Hv >28GPa compared with the coatings obtained under up to 2kpa argonpressure.

关 键 词：碳化硼 涂层 气孔率 等离子喷涂 陶瓷涂层 

分 类 号：TQ174.758[化学工程—陶瓷工业] TG174.453[化学工程—硅酸盐工业]