双层辉光等离子渗镀铬的研究  

Study on Double Glow Plasma Chromizing Technology

作　　者：唐光辉[1] 高原[1] 陈战 吴宏观 

机构地区：[1]桂林电子科技大学,广西桂林541004 [2]武汉首发表面工程有限公司,湖北武汉430000

出　　处：《热处理》2010年第2期19-22,共4页Heat Treatment

基　　金：国家自然科学基金项目(项目编号:50764002);广西区自然科学基金项目(项目编号:桂科自0728207)

摘　　要：利用双层辉光等离子渗金属技术在低碳钢表面进行了不同温度的渗镀铬处理,对用不同工艺获得的渗铬层的相组成、含铬量、表面硬度进行了测试分析。结果表明,通过控制工艺参数可得到沉积层或扩散层或由沉积层与扩散层组成的渗铬层,表面层均由铁及铁铬固溶体组成,表面含铬量最高可达39.49%;与基体相比,渗铬层表面硬度提高不大,固溶强化效果不明显。Chromizing on a low carbon steel was perfomed by a double glow plasma surface metallurgy technology at different temperatures. Phase structure, chromium content and surface hardness of the chromized layers obtained by different processes were measured. The results show that the deposited layer or the diffusion layer or the chromized layer consisted of deposited layer and diffusion layer will be respectively obtained by controlling the process parameters and that the superficial layer will be composed of iron and solid solution of chromium-iron in which the chromium content will be as high as 39.49%. Beyond this,the surface hardness of chromized layer is not obviously higher than that of substrate, i. e. , the chomized layer is not appreciably solid solution strengthened.

关 键 词：双层辉光放电 等离子 渗铬 沉积层 扩散层 

分 类 号：TG174.445[金属学及工艺—金属表面处理]