恒电流电沉积ZnO薄膜及其光电性能研究  

Electrodeposition and photoelectricl properties of ZnO thin films

作　　者：郭幸语[1,2] 程树英[1] 

机构地区：[1]福州大学物理与信息工程学院,福建福州350108 [2]福州大学化学化工学院,福建福州350108

出　　处：《福州大学学报（自然科学版）》2010年第2期223-226,共4页Journal of Fuzhou University(Natural Science Edition)

基　　金：教育部留学回国人员科研启动基金资助项目(LXKQ0801);福建省自然科学基金资助项目(2009J01285);福建省教育厅科研资助项目(JB09010)

摘　　要：采用恒电流电沉积的方法,在ITO导电玻璃上制备ZnO薄膜.通过X射线衍射仪、扫描电子显微镜等手段,对制备出的ZnO薄膜进行表征,并研究了溶液的pH值对薄膜的光学性质的影响.结果表明,电流密度为0.175mA·cm-2、pH为4.7时,制备出的ZnO薄膜具有纤锌矿结构,薄膜表面较均匀、致密,具有很好的附着力,在可见和近红外波段透过率约为80%,禁带宽度为3.37eV.光电流测试表明薄膜的导电类型为n型.ZnO thin films were electrodeposited on ITO-coated glasses successfully. The ZnO films were characterized by X-ray diffraction and scanning electron microscopy analysis. The effects of pH on their optical properties were studied. The results show that,when the current density is 0. 175mA·cm^-2 and pH is 4. 7,the deposited films are ZnO thin films with wurtzite structure,and the films are uniform and dense,and have good adhesion to substrates. The films have transmittance of 80% in the visible and near-infrared wave band and the direct band gap of the films is 3. 37eV. The photoelectrochemical measurement shows that the ZnO films exhibit n-type conductivity.

关 键 词：恒电流 电沉积 ZNO 薄膜 光电性能 

分 类 号：TB383[一般工业技术—材料科学与工程]