用TXRF技术分析镍基溶液中的痕量元素  

Analysis of Trace-Elements in Ni solution By Total Reflection X-Ray Fluorescence

作　　者：刘恺[1] 郑素华[1] 邬旭然[1] 田宇纮 

机构地区：[1]烟台大学,烟台264005

出　　处：《测试技术学报》1998年第3期313-318,共6页Journal of Test and Measurement Technology

摘　　要：本文介绍了应用自制全反射X荧光分析仪,测定了镍基溶液中痕量杂质元素Fe、Co、Cu、Zn、Pb,其中元素最小含量在10^(-1)μg/ml量级。配制的标准样品中Pb的含量最低,0.050μg/ml,分析结果为0.069μg/ml,偏差为±38％。为了减小测量误差,采取用化学方法降低镍含量的措施。降镍稀释处理后的Pb的含量最小,0.015g/ml,还原到原液含量为0.87μg/ml。Ni solution containing Ni in the about 8*104 ug/ml and Co, Cu, Fe, Zn, Pb in the range of 102 to 10-1 ug/ml were analysed by totat reflection X-ray fluorescence(TXRF). It is difficult to determine quickly (35 minutes) the elements content either as low level as 10-1 ug/ml and as wide range as 6 order of magnitude from 10-1 to 104ug/ml. Many conventional methods are not suitable for analyzing the Ni solution due to sensitivity, content range of element, analysis speed and convenience. A total reflection X-ray fluorescence analyzer developed by us was used with the Mo target X-ray tube worked at 46kV-6mA. In order to reduce measurement error of trace elements in the Ni solution, a step of reducing of Ni content was applied. The sample of 10u 1 and internal standard element were piped together onto sample carrier. Count time was 1000s. The obtained spectra were given and the results of TXRF were compared with ones of other conventional method.

关 键 词：镍基溶液 痕量元素分析 全反射 X荧光分析仪 

分 类 号：O657.34[理学—分析化学] O656.21[理学—化学]