聚焦离子束系统中微波离子枪的束光学特性研究  

Studies of the Ion Beam Optics of the Microwave Ion Gun Used in the Focused Ion Beam System

作　　者：施立群[1] 魏澎[1] 王绍虎[2] 冯慧云 彭士香 余增亮[2] 

机构地区：[1]复旦大学现代物理研究所,上海200433 [2]中国科学院等离子体物理研究所,合肥230031

出　　处：《真空科学与技术》1998年第6期415-420,共6页Vacuum Science and Technology

摘　　要：通过实验和数值模拟研究了聚焦离子束系统中微波离子枪的离子束光学特性，该离子枪由微波等离子体源和Orloff-Swason引出透镜组成。该透镜除了广泛用于场致发射离子枪外，在等离子体源情况下，也能获得很好的离子束光学性能。Orloff-Swanson extraction lens has been widely used in field emission ion guns, however, no report of its application in ion guns with a plasma source has been published. Recently, the microwave ion gun was developed, which consists of a microwave plasma source and an Orloff-Swanson extraction lens. In this work, the ion beam optics of the microwave ion gun was studied experimentally and analyzed by numerically simulation. Our results showed that when apped to the ion gun with a plasma source, Orloff-Swanson extraction lens can also provide many good ion beam optics properties.

关 键 词：聚焦离子束 微波离子枪 离子束光学特性 

分 类 号：O463.2[机械工程—光学工程] O539[理学—电子物理学]