光刻探头的共振压力显微系统的研究  

Study of Resonance Force Microscopy System Based on Fabric Silicon Cantilever Detector

作　　者：任韧[1,2,3] 徐进[1] 刘雨君[1] 刘慧玲[1] 任大男[1] 

机构地区：[1]西安交通大学光信息科学系,西安710049 [2]西安交通大学教育部非平衡态与量子调控重点实验室,西安710049 [3]University of Texas at Austin, Texas, USA

出　　处：《半导体光电》2010年第2期249-252,共4页Semiconductor Optoelectronics

基　　金：国家自然科学基金项目(10775111);国家教育部非平衡态与量子调控重点实验室项目;西安交通大学自然基金项目

摘　　要：以磁共振压力显微和半导体核子自旋态研究为目的,采用电子束和等离子体刻印方法制备硅振荡器,脉冲调制序列控制磁共振条件频率和旋转框架翻转,依据样品的自旋-晶格弛豫时间和自旋-自旋弛豫时间,获得了共振显微压力,测试了压力显微的灵敏度。结果表明,光刻的探头具有高Q值和软悬臂低倔强系数K,磁共振压力通过扫描片段和激光光纤干涉得到了极其微小的压力。光刻探头的共振压力显微具有高空间分辨率,兼具核磁共振成像(MRI)和原子压力显微技术(AFM)优点,是一种重要的核自旋探测技术和三维原子分辨率成像的有力方法。Aiming at fabric silicon cantilever and spins study, the resonance force microscopy system was present. The silicon cantilever was fabriced to perfect the Q,K value. Moreover, combining with pulse sequence control and the spin rotate frame system, the experiments analyse the small resonance force and sensitivity. The results show that fabric silicon cantilever have high Q and soft K, the resonance slice and fiber interferometer gain the effective force oscillating, and greatly improved the spatial resolution. The system had advantage of MRI and AFM characteristics. In addition, the simulation indicates that it is powerful tool of magnetic resonance force technology and useful way to 3D atomic resolution microscopy imaging.

关 键 词：半导体光刻 共振压力显微 电子束刻印 等离子刻印 空间分辨率 

分 类 号：TN305.7[电子电信—物理电子学]