靶衬间距对脉冲激光沉积薄膜均匀性的影响  

The effect of target-to-substrate distance on the uniformity of thin films prepared by pulse laser deposition

作　　者：王成伟[1,2] 马军满[1] 陈建彪[1] 

机构地区：[1]西北师范大学物理与电子工程学院,甘肃兰州730070 [2]西北师范大学极端环境原子分子物理实验室,甘肃兰州730070

出　　处：《西北师范大学学报（自然科学版）》2010年第3期39-43,共5页Journal of Northwest Normal University(Natural Science)

基　　金：国家自然科学基金资助项目(10974155;10774121);甘肃省自然科学基金资助项目(0803RJZA102);甘肃省高等学校研究生导师科研项目(0801-09);西北师范大学科技创新工程项目(NWNU-KJCXGC-03-22)

摘　　要：以国产脉冲激光沉积设备(PLD-Ⅲ型)在玻璃衬底上沉积Ti O2薄膜为例,研究了PLD法制膜过程中靶衬间距对薄膜均匀性的影响.实验过程中,以Ti O2陶瓷片作为靶材,玻璃作为衬底,保持其他工艺条件(如单脉冲能量、脉冲频率、沉积脉冲总数、衬底温度等)不变,专门考察了不同靶衬间距下,Ti O2薄膜在整个衬底台平面区域的沉积分布状况.结果表明,按样品的表观灰度划分,薄膜沉积的相对均匀区可分为2～3个轴对称区域,分别对应不同的沉积速率和厚度;在一定范围内调节靶衬间距(3.00～7.00 cm),可使高速率沉积区逐渐由轴对称的圆环状变为中心大圆斑(直径约2.20 cm).结合PLD沉积原理与靶衬之间的几何关系,分析了导致上述结果的机理.The effect of target-to-substrate distance on the uniformity of films prepared by pulse laser deposition（PLD）is investigated,which takes TiO2 films deposited on glass substrates as an example.In deposition process,selecting TiO2 ceramic as target and common glass as substrate,and keeping other technical parameters（such as pulse energy,pulse frequency,substrate temperature,pulse counts,etc.）with same condition,the distribution of TiO2 films on the whole substrate holder is investigated with different target-to-substrate distance.The results show that,based on the apparent greyscale of the as-prepared samples,the relatively uniform areas can be distinguished into 2～3 axisymmetric regions which are corresponding to different deposition rates and film thicknesses.The high rate deposition area gradually can evolve from an axisymmetric circular zone to a larger central spot（～2.20 cm in diameter）by adjusting the target-to-substrate distance within certain range（3.00～7.00 cm）.Furthermore,the mechanism is analyzed according to the principles of PLD and geometrical relationship between target and substrate.

关 键 词：脉冲激光沉积(PLD) 靶衬间距 均匀性 

分 类 号：O484.1[理学—固体物理] TN249[理学—物理]