基于蒙特卡洛模拟法的红外光学系统公差分析  

Monte Carlo simulation and its application in the IR optical system

作　　者：刘琳[1] 张兴德[1] 贺谊亮[1] 

机构地区：[1]华北光电技术研究所,北京100015

出　　处：《激光与红外》2010年第5期496-499,共4页Laser & Infrared

摘　　要：在研究了蒙特卡洛(Monte Carlo)模拟的概念、方法和基本步骤的基础上,讨论了蒙特卡洛模拟在红外光学设计中的应用。运用光学设计软件CODE V进行了中波红外光学系统的蒙特卡洛模拟实例计算。模拟结果表明:用蒙特卡洛模拟法进行公差分析,不仅可以在满足设计要求的前提下使系统的加工和装调公差得到合理分配,还可以正确地预测生产结果,判断设计的合理性。The theory,method,and main course of Monte Carlo simulation were studied.Its application in IR optical system tolerance was discussed.A MWIR optical system tolerance analysis process based on Monte Carlo simulation was illustrated in CODE V.Simulation results indicate that Monte Carlo method,as a broad applicable tolerance design method,can determine the exact structural parameter for fabrication and assembly while assessing the impact of design parameters to final performance of product.

关 键 词：公差分析 红外光学加工 光机装调 

分 类 号：TN216[电子电信—物理电子学]