聚二甲基硅氧烷光栅薄膜制备及光栅常量测量  

Preparation of polydimethylsiloxane grating film and measurement of its grating constant

作　　者：姜兰钰[1] 汪静[1] 周笑辉[1] 迟建卫[1] 曲冰[1] 潘超[1] 刘鑫[1] 

机构地区：[1]大连海洋大学理学院,辽宁大连116023

出　　处：《物理实验》2010年第5期5-7,共3页Physics Experimentation

基　　金：国家自然科学基金资助(No.50773010);辽宁省科学技术计划(No.2008228002);辽宁省教育厅计划(No.2009A172);教育部物理学与天文学教学指导委员会物理基础课程教学指导分委会资助(No:08004);2009年度辽宁省高等教育教学改革研究重点项目(No.A-245)

摘　　要：利用模板技术复制光盘沟槽结构,制备了聚二甲基硅氧烷光栅薄膜,并采用激光光栅衍射方法测量了光盘及复制薄膜的光栅常量.结果表明制备的聚二甲基硅氧烷薄膜光栅衍射现象显著,与光盘的光栅常量一致.The groove structure of compact disc has been copied by adopting the template technology,and polydimethylsiloxane grating film has been prepared.The laser grating diffraction method is used to measure the grating constant of the compact disc and the duplicated film.The results indicate that the grating diffraction phenomenon of the polydimethylsiloxane grating film is remarkable,the measured grating constant is consistent with that of the compact disc.

关 键 词：光盘 沟槽结构 聚二甲基硅氧烷 模板技术 光栅衍射 

分 类 号：O436.1[机械工程—光学工程]