绿豆下胚轴质膜氧化还原系统及其对水分胁迫的反应  

The Redox System in Plasma Mebrane of Mungbean Seedling Hypocotyl and Its Response to Water Stress

作　　者：龚月桦[1] 高俊凤[1] 王俊儒[1] 荆家海[1] 

机构地区：[1]西北农业大学基础科学系

出　　处：《干旱地区农业研究》1999年第1期78-82,共5页Agricultural Research in the Arid Areas

基　　金：国家自然科学基金

摘　　要：绿豆幼苗下胚轴质膜存在有能氧化ＮＡＤＨ和还原Ｋ３Ｆｅ（ＣＮ）６的氧化还原系统。其最适ｐＨ为７．５，最适温度为４０℃，去垢剂ＴｒｉｔｏｎＸ－１００对膜制剂的氧化还原活性有促进作用。外源电子供体ＮＡＤＨ和电子受体Ｋ３Ｆｅ（ＣＮ）６的加入可促进下胚轴组织的Ｈ＋分泌。水分胁迫下活体质膜和离体质膜的Ｋ３Ｆｅ（ＣＮ）６还原活性都下降，变化趋势相似。The redox system which can oxidize NADH and reduce K 3Fe(CN) 6 is present in the plasma membrane of mungbean seedling hypocotyl,with its best pH value being 7.5 and optimum temperature 40℃.PM rdox activities are activated upon additon of 0.05% Triton X-100. Application of electron donor NADH and electon receptor K 3Fe(CN) 6 can enhance H + extrusion of mungbean seedling hypocotyl.Under water stress the abilties of PM both in vivo and in vitro to reduce K 3Fe(CN) 6 are decreased and their changes are similar.

关 键 词：绿豆 氧化还原系统 水分胁迫 

分 类 号：Q945.32[生物学—植物学] S522[农业科学—作物学]