常压化学气相沉积法制备氮化钛薄膜结构和节能性能研究  

Structure and energy saving performance of TiN films prepared by atomspheric pressure chemical vapor deposition

作　　者：段钢锋[1] 赵高凌[1] 林小璇[1] 吴历清[1] 杜丕一[1] 翁文剑[1] 汪建勋[1] 韩高荣[1] 

机构地区：[1]浙江大学材料科学与工程系,硅材料国家重点实验室,浙江杭州310027

出　　处：《功能材料》2010年第5期847-850,共4页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(50672086)

摘　　要：在普通玻璃基板上利用常压化学气相沉积法在580℃条件下制备得到了氮化钛薄膜。对薄膜的结晶性能、断面形貌、方块电阻以及光学透过率和反射率进行了研究。随着沉积时间的增长,薄膜由单层结构变为一种特殊的双层结构,这种双层结构的形成是沉积过程中气相成核机制引起的。光谱结果显示制备得到的薄膜具备一定的阳光控制性能。然而,双层薄膜的红外反射率随沉积时间的增长迅速降低,影响了其阳光控制性能。TiN films for solar control coatings application were deposited on glass substrates by a simple atmospheric pressure chemical vapor deposition method. The crystallization,cross-sectional morphology,sheet resistance,transmittance and reflectance spectra of the films were investigated with respect to the deposition time. The results showed that the structure of the films varied from single-layer to double-layer as the deposition time extended to 180s. The formation of double layer structure can be attributed to the gas phase nucleation and growth during the deposition process. The sheet resistance of the films decreased as the deposition time increased. The UV-Vis spectra showed all the films exhibit solar control performance with visible transmission band and high infrared reflectance. The infrared reflectance of the films with double-layer structure decreased rapidly with the increasing deposition time,which is ascribed to the light scattering induced by the rough surface of the films.

关 键 词：氮化钛 常压化学气相沉积法 沉积时间 结构 阳光控制性能 

分 类 号：TQ134[化学工程—无机化工]