脉冲激光气相沉积法制备的非晶CH薄膜特性分析  

Characteristic analysis of amorphous hydrogenated carbon films prepared by pulsed laser deposition

作　　者：马婷婷[1,2] 王雪敏[2] 王海平[2] 李建根[1,2] 戴阳[1,2] 吴卫东[1,2] 

机构地区：[1]西南科技大学理学院,四川绵阳621010 [2]中国工程物理研究院激光聚变研究中心,四川绵阳621900

出　　处：《强激光与粒子束》2010年第6期1291-1295,共5页High Power Laser and Particle Beams

摘　　要：采用脉冲激光气相沉积（PLD）法,研究了氢气压强对非晶CH薄膜性能的影响。原子力显微镜图和白光干涉图显示,薄膜表面平整致密,随着氢气压强增大,粗糙度变大。拉曼光谱分析表明,氢气压强增加,G峰和D峰位置都在向高波数方向移动。傅里叶变换红外光谱分析显示,薄膜中存在sp3—CH2和sp2—CH等基团。最后,采用PLD漂浮法在最优参数氢气压强为0.3 Pa下,成功制备了不同厚度（100-300 nm）、满足一定力学强度、无明显宏观缺陷的自支撑CH薄膜。Amorphous hydrogenated carbon films were prepared by pulsed laser deposition（PLD） and the effect of the hydrogen pressure upon the performance of the films was studied.The AFM and Wyko images of the film show that the surfaces of the films are smooth and compact and that as the hydrogen pressure increases,the roughness becomes higher.The Raman spectra of the films were analyzed and it shows that the G peak and D peak approach to higher wave numbers as the hydrogen pressure increases.Fourier transform infrared spectroscopy indicates that there exist sp3—CH2 and sp2—CH clusters in the film.With floating method of PLD,self-supporting CH films with different thickness（100~300 nm） were synthesized.

关 键 词：非晶CH薄膜 脉冲激光沉积 自支撑 光谱分析 

分 类 号：O484.41[理学—固体物理]