γ能谱法测定电镀铀靶  

An γ-Spectrometry Analysis Technique for Uranium Target by Electroplating

作　　者：牟婉君[1] 李梅[1] 王小坤[1] 陈琪萍[1] 

机构地区：[1]中国工程物理研究院核物理与化学研究所,四川绵阳621900

出　　处：《核电子学与探测技术》2010年第4期484-486,共3页Nuclear Electronics & Detection Technology

摘　　要：采用γ能谱法及专用的PC/FRAM软件分析测定了3根在不同电镀工艺条件下制备的铀靶。通过比较3根靶上铀的均匀性及丰度,选择制备铀靶最佳的工艺条件。the γ- Spectrometry and special PC/FRAM code were used to analyse three fresh uranium targets, which were electroplated in different condition of electroplating. The optimal process for making uranium target was selected by comparing uniformity and enrichment of three fresh uranium targets.

关 键 词：Γ能谱法 铀靶 均匀性 丰度 

分 类 号：TL817.2[核科学技术—核技术及应用]