表面性质对扫描力显微术成像的影响  

Investigating scanning force microscopy contrast using chemically distinct patterns

作　　者：汤鸣[1] 何会新[1] 蔡生民[1] 刘忠范[1] 

机构地区：[1]北京大学化学与分子工程学院

出　　处：《电子显微学报》1999年第1期111-114,共4页Journal of Chinese Electron Microscopy Society

基　　金：国家攀登计划;杰出人才基金

摘　　要：利用微接触印刷的方法制备了图形化的自组装膜。考察了膜的表面性质对接触式原子力显微镜（ＡＦＭ），摩擦力显微镜（ＦＦＭ）和剪切力显微镜（ＳＦＭ）的成像的影响。发现ＡＦＭ能反映样品的表面形貌，而ＦＦＭ和ＳＦＭ的成像受表面性质的影响较大，在表面性质差别很大的图形表面上会出现图像衬度与表面形貌反转的现象。Chemically distinct patterned surfaces have been fabricated through microcontact printing technique.Contact mode atomic force microscope (AFM),friction force microscope (FFM),and shear force microscope (SFM) were used to map the patterns.AFM images were correlated well with the surface topography. However, FFM and SFM contrast were inverted with respect to the topography,indicating the strong influence of surface property on FFM and SFM imaging.The mechanism of the contrast inversion has been discussed.

关 键 词：扫描力 显微镜 原子力 表面性质 显微术成像 

分 类 号：O484[理学—固体物理] TH742.9[理学—物理]