检索规则说明:AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
检 索 范 例 :范例一: (K=图书馆学 OR K=情报学) AND A=范并思 范例二:J=计算机应用与软件 AND (U=C++ OR U=Basic) NOT M=Visual
作 者:罗尹虹[1] 郭红霞[1] 陈伟[1] 姚志斌[1] 张凤祁[1] 王园明[1]
机构地区:[1]西北核技术研究所,西安710024
出 处:《微电子学》2010年第3期464-468,共5页Microelectronics
摘 要:结合器件版图,通过对2 k SRAM存储单元和外围电路进行单粒子效应激光微束辐照,获得SRAM器件的单粒子翻转敏感区域,测定了不同敏感区域单粒子翻转的激光能量阈值和等效LET阈值,并对SRAM器件的单粒子闭锁敏感度进行测试。结果表明,存储单元中截止N管漏区、截止P管漏区、对应门控管漏区是单粒子翻转的敏感区域;实验中没有测到该器件发生单粒子闭锁现象,表明采用外延工艺以及源漏接触、版图布局调整等设计对器件抗单粒子闭锁加固是十分有效的。Combined with device layout,laser microbeam irradiation of single event effect(SEU) in 2k SRAM memory cell and external circuit was carried out.SEU sensitive regions in SRAM were obtained.Laser energy threshold and equivalent LET threshold of different sensitive regions were determined.Single event latchup susceptibility in SRAM was also measured.Experiment results showed that SEU sensitive regions were at drain regions of the n-channel transistor in off-state,p-channel transistor in off-state and corresponding gate-controlled transistor.No single event latchup was observed in the expeiment,which indicated that epitaxy,source drain contact and adjustment of layout placement used for the device were effective for single event latchup hardening.
分 类 号:TN386.1[电子电信—物理电子学]
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在链接到云南高校图书馆文献保障联盟下载...
云南高校图书馆联盟文献共享服务平台 版权所有©
您的IP:3.20.221.0