亚波长减反射光栅的研究进展  

Research Development of Subwavelength Antireflection Gratings

作　　者：叶鑫[1] 蒋晓东[1] 张继成[1] 王凤蕊[1] 罗炫[1] 方瑜[1] 肖磊[1] 易早[1] 

机构地区：[1]中国工程物理研究院激光聚变研究中心,四川绵阳621900

出　　处：《激光与光电子学进展》2010年第6期29-36,共8页Laser & Optoelectronics Progress

基　　金：国家自然科学基金(60908023)资助课题

摘　　要：介绍了亚波长光栅衍射理论体系以及基于纳米平版印刷术的亚波长减反射光栅的设计与制备、减反射特性和应用等方面的最新研究进展。分析了以亚波长减反射光栅作为光学系统增透元件的可行性。展望了亚波长减反射光栅向可见光、紫外波段的发展趋势,以及在高功率激光领域的应用前景。研究表明,亚波长光栅在减反射和激光损伤方面均具有优异的特性,而且有可能同时实现多种功能,简化光学系统。利用纳米平板印刷术可以使亚波长光栅的制备和应用向可见光、紫外波段方向延伸。The theory of sub-wavelength diffraction grating is introduced and the latest research of design and fabrication,anti-reflection property,and application of sub-wavelength anti-reflection grating based on nanolithography are reviewed.The feasibility of the sub-wavelength anti-reflection grating used as an optical system reflection reducing element is analysed.The trend of development of sub-wavelength anti-reflection grating to visible light,ultraviolet band,as well as the application of sub-wavelength anti-reflection grating in the field of high-power laser is prospected.It is shown that subwavelength gratings exhibit excellent optical property on antireflective and laser-induced-damage thresholds.And the template gratings will simplify optical system because of its excellent optical property.It can make the fabrication and application of subwavelength grating extend to visible light and ultraviolet using nanolithography.

关 键 词：衍射光栅 亚波长减反射光栅 等效介质理论 矢量衍射理论 纳米平版印刷术 

分 类 号：O436[机械工程—光学工程]