ZnO纳米薄膜的电化学制备及其AFM形貌表征  

Preparation of ZnO Nanofilm with Electrodeposition and AFM Characterization

作　　者：袁博[1] 夏惠[1] 王晓雄[1] 徐永祥[1] 李相银[1] 

机构地区：[1]南京理工大学,江苏南京210094

出　　处：《大学物理实验》2010年第3期1-3,共3页Physical Experiment of College

摘　　要：利用恒电位电化学沉积方法在ITO导电玻璃基底上制备了纳米ZnO薄膜,并利用原子力显微镜进行了形貌表征。结果显示,当沉积电压为0.8 V时,经过30 min的沉积在基底上形成了由规则排列的三角形ZnO晶粒构成的纳米薄膜。对晶粒的形成机理进行了初步的讨论。The ZnO nanofilm was prepared on the ITO substrate with eleetrodeposition, and the morphology of the film was characterized by AFM. The results indicate that when the bias was - 0. 8 V, we could obtain the ZnO nano film composed of triangle-shaped ZnO crystal grains after 30min deposition. A brief discussion on the mechanism of the film growth was provided.

关 键 词：电化学沉积 ZnO纳米薄膜 原子力显微镜 形貌 

分 类 号：O484.1[理学—固体物理]