纳米石墨和纳米碳管薄膜在低电场下的稳定场发射  

Stable Field Emission of Nano-structure Graphite and Nano Carbon Tubes Films at Low Electric Field

作　　者：张新月[1] 袁泽明[2] 姚宁[3] 张兵临[3] 

机构地区：[1]郑州航空工业管理学院数理系,郑州450015 [2]郑州财经学院信息学院,郑州450002 [3]郑州大学材料物理教育部重点实验室,郑州450052

出　　处：《人工晶体学报》2010年第3期757-760,共4页Journal of Synthetic Crystals

基　　金：教育部科学技术研究重点项目(No.250091);河南省科技攻关项目(No.092102210166);河南省教育厅自然科学基础研究计划项目(No.2008A140013);河南省基础与前沿技术研究计划(No.092300410139);航空科学基金(No.2009ZE55003)

摘　　要：采用微波等离子体化学气相沉积法(MPECVD)制备出了纳米石墨和纳米碳管混合薄膜材料。通过扫描电镜(SEM)和拉曼光谱(Raman)对薄膜材料的结构和形貌进行了分析。研究了薄膜材料的场发射性能。场发射结果显示:其开启电场为0.7V/μm1,在较低电场下(3.7V/μm1)即可获得5.2mA/cm2的电流密度,此电场下发射点密度可达1.6×107cm-2,发射点均匀,亮度稳定。迭代法计算结果表明制备的纳米石墨和纳米碳管混合薄膜材料的功函数仅为3.2eV。这些表明该薄膜材料为优良的场发射冷阴极材料。The mixture of graphite and nano carbon tubes films were obtained directly on stainless steel plates by microwave plasma chemical vapor deposition system （MPECVD）.The surface morphology and the structure of the films were tested by field emission scanning electron microscopy （SEM）,Raman scattering spectroscopy.Field emission of as-deposited film was then measured.It was found that the turn-on field was very low,which was about 0.7 V/μm1;the current density of 5.2 mA/cm2 was obtained under an electric field of 3.7 V/μm1,the emission sites density reaches 1.6×107 cm-2,emission sites are uniform and the brightness is stability.The work function of the films was calculated by an iterative method.Results indicate that the work function was lower of 3.2 eV.All these characteristics indicate that such deposited nano-structure graphite and nano carbon tubes films are an efficient cold cathode material.

关 键 词：纳米石墨 纳米碳管 场发射 稳定性 

分 类 号：O484[理学—固体物理]