Stable Narrow Linewidth 689 nm Diode Laser for the Second Stage Cooling and Trapping of Strontium Atoms  被引量:4

Stable Narrow Linewidth 689 nm Diode Laser for the Second Stage Cooling and Trapping of Strontium Atoms

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作  者:李烨 林弋戈 赵阳 王强 王少凯 杨涛 曹建平 李天初 方占军 臧二军 

机构地区:[1]Division of Electricity and Quantum Metrology, National Institute of Metrology, Beijing 100013 [2]Department of Precision Instruments and Mechanology, Tsinghua University, Beijing 100084 [3]Department of optical Engineering, Beijing Institute of Technology, Beijing 100081

出  处:《Chinese Physics Letters》2010年第7期126-128,共3页中国物理快报(英文版)

摘  要:We report stable narrow linewidth laser systems based on self-developed Littman configuration external cavity diode lasers (ECDLs). The frequency of the ECDL is stabilized to a high fineness ultralow-expansion glass reference cavity with the Pound-Drever-Hall technique. By heterodyne beating of two identical systems, we conclude that the linewidth 4.3× 10^-14 at an averaging measurement time. of each ECDL is reduced to lower than 150 Hz and its frequency stability reaches time of 1 s, the averaged long-term frequency drift is less than 0.2 Hz/s over 30 hWe report stable narrow linewidth laser systems based on self-developed Littman configuration external cavity diode lasers (ECDLs). The frequency of the ECDL is stabilized to a high fineness ultralow-expansion glass reference cavity with the Pound-Drever-Hall technique. By heterodyne beating of two identical systems, we conclude that the linewidth 4.3× 10^-14 at an averaging measurement time. of each ECDL is reduced to lower than 150 Hz and its frequency stability reaches time of 1 s, the averaged long-term frequency drift is less than 0.2 Hz/s over 30 h

分 类 号:TN752[电子电信—电路与系统] TN247

 

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