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出 处:《Chinese Physics B》2010年第7期333-337,共5页中国物理B(英文版)
基 金:supported by the National High Technology Research and Development of China (Grant Nos. 2006AA01Z256,2007AA03Z419 and 2007AA03Z417);the State Key Development Program for Basic Research of China (Grant Nos. 2006CB604901and 2006CB604902);the National Natural Science Foundation of China (Grant Nos. 90401025,60736036,60706009 and 60777021)
摘 要:We report on chip-scale optical gates based on the integration of evanescent waveguide unitraveling-carrier photo- diodes (EC-UTC-PDs) and intra-step quantum well electroabsorption modulators (IQW-EAMs) on n-InP substrates. These devices exhibit simultaneously 2.1 GHz and -16.2 dB RF-gain at 21 GHz with a 450 t2 thin-film resistor and a bypass capacitor integrated on a chip.We report on chip-scale optical gates based on the integration of evanescent waveguide unitraveling-carrier photo- diodes (EC-UTC-PDs) and intra-step quantum well electroabsorption modulators (IQW-EAMs) on n-InP substrates. These devices exhibit simultaneously 2.1 GHz and -16.2 dB RF-gain at 21 GHz with a 450 t2 thin-film resistor and a bypass capacitor integrated on a chip.
关 键 词:electroabsorption modulator intra-step quantum wells uni-traveling-carrier RF-gain
分 类 号:TN761[电子电信—电路与系统] TN364.2
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