Advanced high-pressure plasma diagnostics with hairpin resonator probe surrounded by film and sheath  

作　　者：徐金洲 石建军 张菁 张琪 中村圭二 菅井秀郎 

机构地区：[1]Department of Applied Physics,College of Science,Donghua University [2]Department of Electrical Engineering,School of Engineering,Chubu University 1200 Matsumoto-cho,Kasugai,Aichi 487-8501,Japan

出　　处：《Chinese Physics B》2010年第7期387-393,共7页中国物理B（英文版）

基　　金：supported by the National Natural Science Foundation of China (Grant No. 10835004 );the 2nd Knowledge Cluster Research Project of Japan:Tokai Region Nanotechnology Manufacturing Cluster (Innovation of Environment Friendly Highly Functional Materials and Devices)

摘　　要：The hairpin probe using microwave resonance in plasma is applicable to high pressure 1.33 ×10^3-1.01×10^5 Pa）） as developed recently. In this work, an analytic model of the hairpin resonator probe surrounded by a thin dielectric layer and a sheath layer is proposed. The correction factor due to these surroundings is analytically found and confirmed by electromagnetic field finite difference time domain simulation, thus enabling the accurate measurement of electron density in a high-pressure non-equilibrium uniform discharge.The hairpin probe using microwave resonance in plasma is applicable to high pressure 1.33 ×10^3-1.01×10^5 Pa）） as developed recently. In this work, an analytic model of the hairpin resonator probe surrounded by a thin dielectric layer and a sheath layer is proposed. The correction factor due to these surroundings is analytically found and confirmed by electromagnetic field finite difference time domain simulation, thus enabling the accurate measurement of electron density in a high-pressure non-equilibrium uniform discharge.

关 键 词：hairpin resonator probe simulation high-pressure plasma transmission line model 

分 类 号：O536[理学—等离子体物理]