基于改进型遗传算法的薄膜厚度及光学常数反演  

Inversions of thickness and optical constants of thin film based on improved genetic algorithm

作　　者：吴先权[1] 华文深[1] 谢大兵[1] 赵莉君[2] 

机构地区：[1]军械工程学院光学与电子工程系,河北石家庄050003 [2]哈尔滨工业大学理学院,黑龙江哈尔滨150001

出　　处：《光学仪器》2010年第3期86-90,共5页Optical Instruments

摘　　要：准确的测量薄膜的厚度和光学常数,在薄膜的制备、研究和应用中都十分重要。借助Cauchy色散模型和P阶评函数,通过薄膜透过率测量曲线,用改进的遗传算法对透过率曲线进行全光谱拟合,从而反演得到薄膜的厚度和光学常数。理论验证是对电子束蒸发制备的TiO_2和反应磁控溅射制备的Si_3N_4薄膜进行测试拟合,计算得到的结果与文献报道的一致,误差小于0.5%。It very important to measure thickness and optical constants accurately for film fabrication, research and application. With Cauchy dispersion model and Pth-order evaluation function, the optical constants and thickness of thin film are inversed by fitting the curve of transmission spectrum using whole optical spectrum fitting based on improved genetic algorithm. The results of TiO2 and Si3 N4 thin films deposited by electron gun evaporation and reactive magnetron sputtering respectively are in good agreement with those reported in the literature, and the errors are less than 0. 5%.

关 键 词：光学薄膜 透过率 色散模型 遗传算法 

分 类 号：O484.5[理学—固体物理]