亚微米分步重复投影光刻机总体设计考虑的几个问题  

SEVERAL CONSIDERATIONS IN OVERALL DESIGN OF SUB MICRON STEPPER

作　　者：陈旭南[1] 

机构地区：[1]中国科学院光电技术研究所微细加工光学技术国家重点实验室

出　　处：《微细加工技术》1999年第1期25-30,共6页Microfabrication Technology

摘　　要：介绍对亚微米分步重复投影光刻机光刻工作分辨力、套刻和生产能力三项主要技术指标的设计分析，方案考虑以及采取的技术措施。测试结果表明这些考虑是必要并且有效的，它为光刻机的研制成功打下基础，也为设计下一代指标要求更高的光刻机提供有益的参考。The analysis and design of three main specifications (resolution, overlay and throughput) and technology methods taken in the sub micron stepper are described . Test results show that those considerations are necessary and effective. They lay the foundations for the successful fabrication of the stepper and they are profitable references to the investigation of next generation stepper.

关 键 词：光刻机 设计 工作分辨力 套刻 微电子器件 

分 类 号：TN405.7[电子电信—微电子学与固体电子学]