ZnO纳米墙薄膜的低温水热制备及其性能研究  

Low Temperature Hydrothermal Growth and the Properties of ZnO Nanowall Films

作　　者：张雯[1] 贺永宁[2] 崔万照[2] 

机构地区：[1]西安交通大学理学院,陕西西安710049 [2]西安交通大学电信学院,陕西西安710049

出　　处：《化学工业与工程》2010年第4期283-287,共5页Chemical Industry and Engineering

基　　金：国家自然科学基金项目(60876038);总装备部武器预研基金资助项目(9140C5304020804);西安交通大学校内基金资助项目(08140011)

摘　　要：利用控制水解浸涂法在氧化铟锡(ITO)导电玻璃上制备籽晶层,进而通过低温水热法和热处理获得了独特的氧化锌(ZnO)纳米墙薄膜结构。通过X射线衍射谱(XRD)、扫描电镜(SEM)、光电子能谱(EDS)、红外光谱(FTIR)、紫外-可见光谱(UV-Vis)和光致发光谱(PL)等对薄膜的形貌、组成和结构进行了分析表征。研究表明,ZnO纳米墙由20～100 nm厚的片层交织而成,在热处理前薄膜的组成为混合的ZnO、醋酸锌(ZnAc)和羟基醋酸锌(Zn-LHS),经500°C热处理脱除CO2、H2O等小分子后基本完全转变为ZnO,而原有层状交织纳米墙结构保留下来。室温PL谱显示薄膜在383 nm处有较强烈的紫外激发峰。结合晶体生长理论探讨了ZnO纳米墙薄膜的生长机制。Unique ZnO nanowall films have been synthesized by control hydrolysis for seeds growing from sol-gel dip-coating process on ITO substrates followed a low temperature hydrothermal treatment.X-ray diffraction（XRD）,scanning electron microscopy（SEM）,energy dispersive spectroscopy（EDS）,In-ferred reaction spectroscopy（FTIR）,ultraviolet-visible spectroscopy（UV-Vis） and room temperature photoluminescence（PL） spectrum have been used to characterize the morphology,composition and structures of the films.The results show that the nanowalls are connected to each other with a thickness of about 20—100 nm.The films are composed of ZnO,zinc acetate（ZnAc） and zinc acetate layered hy-droxy salts（Zn-LHS） before sintering,and they completely change to ZnO by pyrogenation of small mol-ecules such as CO2,H2O after treatment at 500 ℃ with the unique structure remaining unchanged.Pho-toluminescence measurements show strong UV emission at 383 nm.The growth mechanism of ZnO nanowall films has been proposed according to crystal growth theory.

关 键 词：ZNO 纳米墙 光致发光 低温水热生长 

分 类 号：TQ132.4[化学工程—无机化工]