热等静压对铀基钛镀层的影响  

Effect of Hot Isostatic Pressing on the U/Ti Coating

作　　者：张羽廷[1] 张鹏程[1] 谢东华[2] 王庆富[1,2] 刘婷婷[1] 

机构地区：[1]表面物理与化学国家重点实验室,四川绵阳621907 [2]中国工程物理研究院,四川绵阳621900

出　　处：《稀有金属材料与工程》2010年第A01期501-503,共3页Rare Metal Materials and Engineering

基　　金：中国物理研究院双百人才资助项目(双2008-2)

摘　　要：采用扫描电镜(SEM),能谱仪(EDS),X-射线衍射仪(XRD)等方法,研究了U上磁控溅射Ti镀层在600℃,0.5h,150MPa条件下热等静压(HIP)处理对其表面界面特性及界面扩散的影响。结果表明:经HIP处理后,镀层致密性提高,膜基结合强度也提高,U、Ti在界面的扩散受到压力的抑制。Effect of hot isostatic pressing （HIP） on characteristics of titanium coating on uranium substrate, which were prepared by magnetron sputtering, and treated under the condition of 600 ℃, 0.5 h, 150 MPa were investigated by scanning electron microscopy （SEM）, energy dispersive spectrometer （EDS）, X-ray diffraction （XRD）. The results show that the coating gets compacter, adhesion strength increases, and the interdiffusion of U and Ti is suppressed.

关 键 词：热等静压(HIP) 铀/钛 界面扩散 

分 类 号：TG174.44[金属学及工艺—金属表面处理]