热处理温度对WO_3薄膜微观结构和光致变色性能的影响  

Effects of Heat Treatment Temperature on the Microstructure and Photochromic Properties of WO_3 Films

作　　者：沈毅[1] 颜莎宁[1] 赵丽[2] 曹元媛[1] 

机构地区：[1]中国地质大学(武汉),湖北武汉430074 [2]湖北大学,湖北武汉430062

出　　处：《稀有金属材料与工程》2010年第A01期504-507,共4页Rare Metal Materials and Engineering

基　　金：国家自然科学基金青年基金(50702052);湖北省教育厅科学技术研究项目(Q20091007)

摘　　要：以溶胶-凝胶浸渍提拉法制备WO3光致变色薄膜。用色差计表征了材料的光致变色特性,并结合XRD、AFM、SEM、TEM、UV-Vis等手段,研究了热处理温度变化对其微观结构及光致变色性能的影响。结果表明,WO3薄膜光致变色性能随热处理温度升高而增强。当温度为350℃时,色差达到最大值2.2462,这是因为传导电子浓度随温度的升高而增大,有利于光生电子和空穴的产生,且此时禁带宽度最窄,电子易被激发到导带。当温度为400℃时,晶粒粗大,比表面积减小,光致变色性能降低。温度升至450℃时,晶格发生畸变,不利于电子空穴对分离,光致变色性能进一步降低。WO3 thin films were prepared via sol-gel dip-coating method. The photochromic properties of the WO3 thin films were characterized by color difference meter; effects of heat treatment temperature on its microstructure and photochromic properties were investigated by XRD, AFM, SEM, TEM and UV-Vis. The results show that the photochromic properties of the WO3 thin films are enhanced with the rise of heat treatment temperature. When it is 350 ℃, the color difference reaches to the top of 2.2462, which is because the conduction electron concentration increasing with the rise of heat treatment temperature is propitious to produce photo-generated electron hole pairs. And it is easy to promote the electrons to conduction band at the narrowest band gap. When it is 400 ℃, the sample obtains depressed photochromic properties resulting from crassitude grains and decreasing specific surface area. When it is up to 450 ℃, the photochromic properties are further reduced, as lattice distortion goes against the separation of electron hole pairs.

关 键 词：光致变色 WO3薄膜 热处理温度 

分 类 号：O484.41[理学—固体物理]