微透镜列阵成像光刻技术  

Microlens array imaging-based photolithography technique

作　　者：张为国[1] 董小春[1] 杜春雷[1] 

机构地区：[1]中国科学院光电技术研究所,四川成都610209

出　　处：《红外与激光工程》2010年第3期469-472,共4页Infrared and Laser Engineering

基　　金：863计划资助项目(2007AA03Z332)

摘　　要：介绍了一种利用微透镜列阵投影成像光刻的周期微纳结构加工方法。该方法采用商业打印机在透明薄膜上打印的毫米至厘米尺寸图形为掩模,以光刻胶作为记录介质,以微透镜列阵为投影物镜将掩模缩小数千倍成像在光刻胶上,曝光显影后便可制备出微米、亚微米特征尺寸的周期结构列阵。基于该方法建立了微透镜列阵成像光刻系统,并以制备800nm线宽、50mm×50mm面积的图形列阵为例,实现了目标图形的光刻成形,曝光时间仅为几十秒,图形边沿粗糙度低于100nm。该方法系统结构简单、掩模制备简易、曝光时间短;为周期微纳结构的低成本、高效率制备提供了有效途径。A periodic microstructure fabrication method by use of microlens array imaging photolithography was presented. In this method, macroscopic （mm-~cm-sized） transparent films were used as the masks, and photoresist was used as the recording medium. The mask image was projected onto the photoresist by use of the microlens array with thousandfold size shrinkage, and a periodic pattern with micro/sub-micrometer feature size could be formed after exposure. The microlens array imaging photolithography system based on this method was established, and an array pattern with 800 nm line width and an area of 50 mm×50 mm was fabricated as an example. It only took us dozens of seconds to fabricate these array patterns, and the roughness of the image was less than 100 nm. The main advantages of this method include inexpensive and simple equipment system, easy image fabrication and short exposure time. Experiments show that microlens imaging photolithography is a promising technology to fabricate micro/nano-structured material and element with low cost and high efficiency.

关 键 词：微纳光学 成像光刻 微透镜列阵 微纳结构 

分 类 号：O43[机械工程—光学工程]