紫外激光预处理对熔石英表面损伤影响的实验研究  

Experiment studies on effect of ultraviolet laser conditioning on silica surface damage

作　　者：李熙斌[1] 吕海兵[1] 王海军[1] 黄进[1] 徐世珍[1] 袁晓东[1] 郑万国[1] 

机构地区：[1]中国工程物理研究院激光聚变研究中心,四川绵阳621900

出　　处：《光学技术》2010年第4期546-549,共4页Optical Technique

基　　金：国家高技术研究发展计划专项经费(2006AA8048040)资助课题

摘　　要：搭建了紫外激光预处理平台,实验研究了紫外激光对熔石英基片的预处理效果。通过对比不同样片可以看出:熔石英的表面质量对预处理效果影响明显;表面原生缺陷和初始损伤的数量越多,尺度越大,辐照后的预处理效果越明显;预处理时,能量增幅采用零损伤阈值的20%为宜,预处理能量的最高值一般应达到样片零损伤阈值的80%左右。实验发现,损伤后的损伤扩展阈值一般为初始损伤阈值的1/3左右。The ultraviolet laser conditioning experiment device is set up. Effect of UV laser conditioning on silica chip is studied experimentally. Comparing different samples,it is found that surface quality has obvious impact on conditioning effect. The higher percentage of vices and impurities is,the more obvious effect of conditioning is. During pretreatment,After each scan,20 percent of initial damage threshold is added to primary energy,and 80 percent of initial damage threshold is feasible for maximal condition energy. If initial damage occurs,1/3 of initial damage threshold can result in damage again.

关 键 词：紫外激光 预处理 熔石英基片 损伤阈值 

分 类 号：TN249[电子电信—物理电子学]