公自转磁流变抛光循环装置及其稳定性  

Stable fluid circulation system for a compound rotary MRF

作　　者：左巍[1] 张云[1] 冯之敬[1] 辛科[1] 赵广木[1] 

机构地区：[1]清华大学精密仪器与机械学系,制造工程研究所,北京100084

出　　处：《清华大学学报（自然科学版）》2010年第7期1000-1004,共5页Journal of Tsinghua University(Science and Technology)

基　　金：国家自然科学基金资助项目(50675116)

摘　　要：磁流变抛光中磁流变液的循环更新是产生确定性去除的重要条件。该文针对循环系统展开分析,讨论了机械结构稳定性、磁流变悬浮液性质、循环系统压力流量稳定性及温度稳定性等因素的影响;并针对公自转磁流变抛光设备提出了特有的轮上磁流变液循环装置,开展了相关的分析和实验研究。结果表明:该轮上循环装置满足了公自转加工的要求,并且明显增强了公自转磁流变抛光设备的去除稳定性和去除效率。The circulation system used for magnetorheological finishing（MRF） plays an important role in the deterministic polishing process.The circulation system stability is mainly affected by the mechanical structure,the fluid conditions,the magnetic field and the temperature.An on-wheel circulation method for a compound rotary MRF machine was designed with tests to show that the method works well with the compound rotary MRF process.The stability and efficiency of the particle removal function are enhanced by the on-wheel circulation.

关 键 词：磁流变抛光 循环更新 确定性去除 去除函数 公自转 

分 类 号：TH7[机械工程—仪器科学与技术]