氯化物镀锌液中的阴离子杂质与有机杂质  

Anionic and organic impurities in chloride zinc plating bath

作　　者：袁诗璞 

机构地区：[1]成都市机投镇会所花园A3—02—202,四川成都610045

出　　处：《电镀与涂饰》2010年第8期12-17,共6页Electroplating & Finishing

摘　　要：介绍了氯化物镀锌液中硝酸根、铬酸根等阴离子,以及油污、光亮剂分解产物、表面活性剂等有机杂质的影响和去除方法。提出了减少有机杂质积累的若干措施,如坚持添加剂少加勤加的原则,控制好溶液组分(尤其是氯化钾和硼酸)和液温、pH等工艺条件,采用增溶性好的载体,以及研发新型光亮剂。The effects and removal methods of anionic impurities such as nitrate and chromate as well as organic impurities including grease, decomposition products of brighteners and surfactants in chloride zinc plating bath were described. Some measures for reducing the accumulation of organic impurities were presented, such as less and frequent addition of additives, proper control of the compositions （especially potassium chloride and boric acid） and process conditions （such as bath temperature and pH）, use of carriers with good solubilization, and development of novel brighteners.

关 键 词：氯化物镀锌 阴离子 有机杂质 去除 

分 类 号：TQ153.15[化学工程—电化学工业]