退火处理对Y_2O_3薄膜结构和光学性能的影响  

Effect of Anneal Treatment on Structure and Optical Properties of Yttrium Trioxide Thin Films

作　　者：闫锋[1] 刘正堂[1] 刘文婷[1] 刘其军[1] 

机构地区：[1]西北工业大学材料学院,西安710072

出　　处：《材料导报》2010年第16期12-14,28,共4页Materials Reports

基　　金：航空科学基金资助项目(04G53043)

摘　　要：采用射频磁控溅射法以Y2O3陶瓷为靶材在单晶Si(111)和石英表面制备了Y2O3薄膜。利用X射线衍射(XRD)仪、扫描电子显微镜(SEM)、紫外-可见(UV-VIS)光谱仪和傅立叶变换红外(FTIR)光谱仪对真空退火前后Y2O3薄膜的结构和光学性质进行了分析研究。结构研究表明,在200℃条件下制备的Y2O3薄膜为非晶态,经600℃退火后出现单斜相,经800℃退火后薄膜完全转化为立方多晶,同时得到了不同晶面的晶粒尺寸;沉积态的Y2O3薄膜由球状颗粒排列组成,经800℃真空退火后薄膜为柱状晶。光学性质研究发现,真空退火后Y2O3薄膜的红外透过率显著下降;使用Tauc作图法得到不同结晶条件下的光学带隙,发现薄膜的光学带隙与结晶条件有关,并且退火后薄膜的光学带隙明显减小。Yttrium trioxide（Y2O3 ） thin films are prepared on silicon（111） and quartz substrates by RF magnetron sputtering using stoichiometric Y2O3 ceramic as target. The structure and optical properties of Y2O3 thin films are studied before and after vacuum anneal treatment using X-ray diffraction （XRD）, scanning electron microscope （SteM）, ultravio-let-visible （UV VIS） spectroscopy, fourier transform infrared （FTIR） spectroscopy. The structure study shows that amorphous Y2O3 thin films are made at 200 ℃. The monoelinic phase appears after anneal treatment at 600℃ in vacuu-m. Complete transformation of the film structure from the amorphous structure to the cubic polycrystal structure is observed by annealing at 800℃, and the grain sizes of different crystal orientation are obtained from XRD results; as-deposi-ted Y2O3 film is composed of spherical particles and the grain is columnar in Y2O3 film after annealing at 800℃. The optical study shows that the transmittance of Y2O3 film decreases obviously after annealing at 800℃ in vacuum. Optical band-gap of Y2O3 films under different crystallization conditions are obtained by Tauc method. They are related to crystallization conditions and decrease after annealing.

关 键 词：Y2O3薄膜 晶体结构 退火处理 透过率 光学带隙 

分 类 号：O484.4[理学—固体物理]