Young's modulus characterization of low-k films of nanoporous Black Diamond^(TM) by surface acoustic waves  

Young's modulus characterization of low-k films of nanoporous Black Diamond^(TM) by surface acoustic waves

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作  者:单兴锰 肖夏 刘亚亮 

机构地区:[1]School of Electronic and Information Engineering,Tianjin University

出  处:《Journal of Semiconductors》2010年第8期6-10,共5页半导体学报(英文版)

基  金:Project supported by the National Natural Science Fotmdation of China(No.60876072);the New Century Excellent Talents in University,China(No.NCET-08-0389).

摘  要:The laser-generated surface acoustic wave(SAW) technique is an accurate,fast and nondestructive solution to determine the mechanical properties of ultra thin films.SAWs are dispersive during the wave propagation on the layered structure.The Young's moduli of thin films can be obtained by matching the experimentally and theoretically calculated dispersive SAW curves.A short ultraviolet laser pulse is employed to generate the broad spectral range of the dispersive SAWs.The frequency range of dispersive SAWs in this study reaches 180 MHz,which is adequate for the SAW technique applied for the investigated samples.In this work,the Young's moduli of a series of nanoporous Black Diamond^(TM) low dielectric constant(low-k) films deposited on a Si(100) substrate are characterized successfully by the SAW technique.The laser-generated surface acoustic wave(SAW) technique is an accurate,fast and nondestructive solution to determine the mechanical properties of ultra thin films.SAWs are dispersive during the wave propagation on the layered structure.The Young's moduli of thin films can be obtained by matching the experimentally and theoretically calculated dispersive SAW curves.A short ultraviolet laser pulse is employed to generate the broad spectral range of the dispersive SAWs.The frequency range of dispersive SAWs in this study reaches 180 MHz,which is adequate for the SAW technique applied for the investigated samples.In this work,the Young's moduli of a series of nanoporous Black Diamond^(TM) low dielectric constant(low-k) films deposited on a Si(100) substrate are characterized successfully by the SAW technique.

关 键 词:ULSI interconnect SAWS Young's modulus Black Diamond^(TM) nanoporous low-k film 

分 类 号:O484.4[理学—固体物理]

 

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